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    CONVENTIONS/TRADE SHOWS

    SPIE Advanced Lithography 2010

    Presented by SPIE Advanced Lithography at San Jose Convention Center

    February 21-February 25, 2010

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    SPIE Advanced Lithography 2010
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    SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography. SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and...

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    SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography. SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

    Presentations will focus on Alternative Lithographic Technologies; Metrology, Inspection, and Process Control for Microlithography; Advances in Resist Materials and Processing Technology; Optical Microlithography; and Design for Manufacturability through Design-Process Integration.


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    San Jose Convention Center

    150 W. San Carlos Street
    San Jose, CA 95113

    Full map and directions

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